Room Temperature Mechanical Loss of Silicon Nitride-Silica Quarter-wave Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Method

Document #:

LIGO-G1601702-v4

Document type:

G - Presentations (eg Graphics)

Abstract:

Room Temperature Mechanical Loss of Silicon Nitride-Silica Quarter-wave Stacks Deposited by Plasma Enhanced Chemical Vapor Deposition (PECVD) Method

Files in Document:

• 2016-aug-LVC-meeting-ppt-20160830.pdf (file is not accessible)

Other Files:

• 2016-aug-LVC-meeting-ppt-20160830.pptx (file is not accessible)

Topics:

• Meeting
• Core Optics

Authors:

• Huang-wei Pan
• Ling-Chi Kuo
• Shu-Yu Huang
• Yu-Hang Juang
• Shiuh Chao

Keywords:

Silicon nitride silica quarter-wave stack PECVD mechanical loss,