Room temperature mechanical loss of high stress silicon nitride film measured by cantilever ring-down method on double-side coated cantilever

Document #:

LIGO-G1501068-v2

Document type:

G - Presentations (eg Graphics)

Abstract:

We report results of the loss angle measurement for high stress PECVD silicon nitride films.

Files in Document:

• LVC meeting SiN 20150831.pdf (file is not accessible)

Topics:

• Meeting

Authors:

• Shiuh Chao
• Huang-wei Pan
• Shu-Yu Huang
• Ling-Chi Kuo

Keywords:

silicon nitride

Referenced by: