LIGO Document G1300171-v1
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Mechanical loss of silicon nitride films grown by plasma-enhanced chemical vapor deposition (PECVD) method
Document #:
LIGO-G1300171-v1
Document type:
G - Presentations (eg Graphics)
Other Versions:
Abstract:
Preliminary report of the mechanical loss of the silicon nitride films were given.
Files in Document:
Mechanical loss of silicon nitride films grown by plas...pdf
(file is not accessible)
Other Files:
USA conference of Silicon nitride 20130309.pdf
(file is not accessible)
Topics:
Meeting
Authors:
Shiuh Chao
Huang-wei Pan
Ling-Chi Kuo
Keywords:
silicon
nitride
films
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